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Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural and magnetic properties
APL MATERIALS
URBÁNEK, M.; FLAJŠMAN, L.; KŘIŽÁKOVÁ, V.; GLOSS, J.; HORKÝ, M.; SCHMID, M.; VARGA, P., 2018: Research Update: Focused ion beam direct writing of magnetic patterns with controlled structural and magnetic properties. APL MATERIALS 6(6), p. 060701-1 - 7, doi: 10.1063/1.5029367; FULL TEXT
(HELIOS, UHV-XPS, UHV-PREPARATION, UHV-DEPOSITION, RIGAKU9, KERR-MICROSCOPE, LYRA, ICON-SPM)
Equipment:
- Focused Ion Beam/Scanning Electron Microscope FEI Helios NanoLab 660
- Ultra High Vacuum Preparation and Analytical system - Photoelectron Spectroscopy SPECS Phoibos 150
- Ultra High Vacuum Preparation and Analytical System - Preparation Chamber SPECS
- Ultra High Vacuum Preparation and Analytical System - Custom Deposition Chamber SPECS
- X-ray diffractometer with high brightness source Rigaku SmartLab 9kW
- Magneto-optical Kerr microscope
- Focused Ion Beam/Scanning Electron Microscope TESCAN LYRA3
- Scanning Probe Microscope Bruker Dimension Icon
Research Groups:
CEITEC authors: