Resist coating and development system SÜSS MicroTec RCD8 (SUSS-RCD8)

Guarantor: Radim Hrdý, Ph.D.
Technology / Methodology: Nanolitography infrastructure
Instrument status: Operational, 22.1.2024 12:45, The EBR valve has been repaired. Please, test the EBR function and give us feedback. Thank you.
Equipment placement: CEITEC Nano - C1.30
Research group: CF: CEITEC Nano

Description:

Resist mask preparation for fabrication of nano and microstructures with ultimate dimensions below 50 nm. Includes resist spin coating facility, complete photolithography setup and electron beam lithography / shared by CEITEC users, open facilities

Publications:

KAMNEV, K.; PYTLÍČEK, Z.; BENDOVÁ, M.; PRÁŠEK, J.; GISPERT-GUIRADO, F.; LLOBET, E.; MOZALEV, A., 2023: The planar anodic Al2O3-ZrO2 nanocomposite capacitor dielectrics for advanced passive device integration. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS 24(1), p. 1 - 17, doi: 10.1080/14686996.2022.2162324; FULL TEXT
(MAGNETRON, SUSS-MA8, SUSS-RCD8, VERIOS, KRATOS-XPS, MPS150)
Hnilica, J., 2023: Current-induced domain wall propagation in ferrimagnetic wires. MASTER´S THESIS ; FULL TEXT
(MAGNETRON, VERSALAB, RIGAKU9, SUSS-RCD8, DWL, WIRE-BONDER, KERR-MICROSCOPE)
Midlik, Š.; Sadílek, J.; Xie, Z.; Huang, Y.; Schmoranzer, D., 2022: Silicon Vibrating Micro-Wire Resonators for Study of Quantum Turbulence in Superfluid He-4. JOURNAL OF LOW TEMPERATURE PHYSICS , doi: 10.1007/s10909-022-02675-2; FULL TEXT
(PECVD, RIE-FLUORINE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, LYRA)
KARTCI, A.; VANČÍK, S.; PRÁŠEK, J.; HRDÝ, R.; SCHNEIDER, M.; SCHMID, U.; HUBÁLEK, J., 2022: Comparison of on-chip MIS capacitors based on stacked HfO2/Al2O3 nanolaminates. MATERIALS TODAY COMMUNICATIONS 33, p. 1 - 8, doi: 10.1016/j.mtcomm.2022.104664; FULL TEXT
(ALD, EVAPORATOR, SUSS-MA8, SUSS-RCD8, MAGNETRON, TITAN, MPS150, KEITHLEY-4200, SUMMIT, KRATOS-XPS)
Gaňová, M., 2022: Digital PCR development. PH.D. THESIS , p. 1 - 92; FULL TEXT
(SUSS-MA8, SUSS-RCD8, PARYLENE)

Brodský J., 2021: Gas sensors based on 1D and 2D materials. MASTER´S THESIS , p. 1 - 84; FULL TEXT
(DWL, DIENER, SUSS-RCD8, SUSS-MA8, EVAPORATOR, MPS150, WITEC-RAMAN, RIE-FLUORINE, DRIE, LYRA, ICON-SPM)
Dhankhar, M.;, 2021: Magnetic vortex based memory device. PH.D. THESIS , p. 1 - 100; FULL TEXT
(KERR-MICROSCOPE, DWL, MIRA-EBL, RAITH, KAUFMAN, EVAPORATOR, MAGNETRON, ALD, WIRE-BONDER, SUSS-RCD8, ICON-SPM)
GABLECH, I.; BRODSKÝ, J.; PEKÁREK, J.; NEUŽIL, P., 2020: Infinite selectivity of wet SiO2 etching in respect to Al. MICROMACHINES 11(4), p. 365 - 7, doi: 10.3390/mi11040365; FULL TEXT
(EVAPORATOR, SUSS-MA8, RIE-CHLORINE, DWL, SUSS-RCD8)
Chmela, O., 2020: Progress toward the development of single nanowire-based arrays for gas sensing applications. PH.D THESIS , p. 1 - 199
(ALD, DWL, KAUFMAN, DIENER, SUSS-MA8, SUSS-RCD8, RAITH, MAGNETRON, EVAPORATOR, RIE-FLUORINE, SCIA, DEKTAK, NANOCALC, MPS150, WIRE-BONDER, ICON-SPM)
LIU, X.; FECKO, P.; FOHLEROVÁ, Z.; PEKÁREK, J.; KARÁSEK, T.; NEUŽIL, P., 2020: Parylene Micropillars Coated with Thermally Grown SiO2. JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B 38(6), p. 38 - 6, doi: 10.1116/6.0000558; FULL TEXT
(SUSS-MA8, SUSS-RCD8, DWL, DRIE, RIE-FLUORINE, PARYLENE, XEF2, APCVD, LYRA)
PRÁŠEK, J.; HOUŠKA, D.; HRDÝ, R.; HUBÁLEK, J.; SCHMID, U., 2019: Optimization of Cryogenic Deep Reactive Ion Etching Process for On-Chip Energy Storage. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE , p. 1 - 6, doi: 10.1109/ISSE.2019.8810293; FULL TEXT
(DRIE, SUSS-MA8, SUSS-RCD8, EVAPORATOR, DWL, ICON-SPM)
Fecko, P., 2019: Gecko mimicking surfaces. MASTER´S THESIS , p. 1 - 52
(SUSS-RCD8, SUSS-MA8, DWL, DRIE, ALD, RIE-FLUORINE, PARYLENE, XEF2, LYRA, ICON-SPM)
HRDÝ, R.; PRÁŠEK, J.; FILLNER, P.; VANČÍK, S.; SCHNEIDER, M.; HUBÁLEK, J.; SCHMID, U., 2019: Development of HfO2/Al2O3 Stack for On-Chip Capacitor Applications. INTERNATIONAL SPRING SEMINAR ON ELECTRONICS TECHNOLOGY ISSE , p. 1 - 4, doi: 10.1109/ISSE.2019.8810156; FULL TEXT
(ALD, SUSS-MA8, EVAPORATOR, SUSS-RCD8, DWL, RIE-CHLORINE)

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